V-1000 Vacuum Ultraviolet Spectrophotometer

The V-1000 provides rapid sample measurements without evacuation of the entire instrument by using a nitrogen purge and dual sample exchange cabinets to enhance purge efficiency.

Features

System Description

Miniaturization of wafer manufacturing processes has promoted the shift towards shorter photolithography wavelengths. Currently, ArF lasers (193 nm) are most currently used. Research on the practical implementation of F2 (157 nm) has reduced the imprinting node to 0.07 µm.

The V-1000 was designed to evaluate optical properties in the wavelength range between 115 and 300 nm. Typically, instrument optical paths for analyses in this range are evacuated due to the strong absorption of oxygen, thus, the ‘vacuum’ ultraviolet range. Superior photometric reproducibility is achieved by using a double monochromator for elimination of stray light and a reference stabilized double-beam system to maintain baseline stability.

System Features

Highly Accurate Measurements in the vacuum UV range

Double monochromator and reference stabilized double-beam system achieves a photometric reproducibility of 0.03% .

Rapid switchover between transmission/reflection measurement

Samples are easily loaded for either reflection measurements at 5° or 45° or transmission measurements without replacing sampling accessories. Please contact us if you require a special configuration.

Quick measurements

By increasing purge efficiency and eliminating dead space in the optical path, measurements are completed within minutes.

V-1000 Specifications

Wavelength Range	115 to 300 nm
Photometric Reproducibility	Standard deviation at 157 nm: ±0.03 % or less for material with 70 %T or greater
Spectrophotometer	Double monochromator with dual concave gratings and reference stabilized double-beam system
Instrument Resolution	3 nm (Optional: 1 nm)
Light Source	Deuterium lamp
Detector	Photomultiplier tube (PMT)
Purge	Nitrogen purge (Sample chamber purged separately)
Measurement Configuration	Transmission and 5° or 45° incidence reflection (standard)
Optional Accessories	Absolute reflection and polarization dependence
Sample Size	Maximum sample size 50.8 mm diameter and 10 mm thickness
Data Collection and Analysis Software	Spectral scanning, fixed wavelength, baseline correction, smoothing, spectral arithmetic, peak area, peak height, peak half width, and data conversion routines
Supplied Support Equipment	Support bench, oxygen monitor, vacuum gauge and vacuum pump
Size	1300(W) x 700(D) x 1200(H)
Weight	Approx. 450 kg
Power Requirement	130 VA

Details

Superb Photometric Reproducibility

This example uses a calcium fluoride window 30 mm in diameter and 2 mm thick.
One hundred consecutive measurements were taken on five separate occasions using a wavelength of 157.6 nm.